Please use this identifier to cite or link to this item: http://www.repositorio.cdtn.br:8080/jspui/handle/123456789/487
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dc.contributor.authorSabioni, Antônio Claret Soares-
dc.contributor.authorRamos, Marcelo José Ferreira-
dc.contributor.authorFerraz, Wilmar Barbosa-
dc.date.accessioned2016-08-29T18:47:31Z-
dc.date.available2008-04-15-
dc.date.available2016-08-29T18:47:31Z-
dc.date.issued2003-
dc.identifier.issnISSN 1516-1439-
dc.identifier.urihttp://www.repositorio.cdtn.br:8080/jspui/handle/123456789/487-
dc.language.isoInglês-
dc.rightsL-
dc.subjectOxygen-
dc.subjectdiffusion-
dc.subjectzinc oxide-
dc.subjectpoint defects-
dc.subjectsemiconductor resistors-
dc.titleOxygen diffusion in pure and deped ZnO-
dc.typeArtigo Periódico-
dc.creator.affiliationUniversidade Federal de Ouro Preto/UFOP, Minas Gerais, Brasil-
dc.creator.affiliationUniversidade Federal de Ouro Preto/UFOP, Minas Gerais, Brasil-
dc.creator.affiliationCentro de Desenvolvimento da Tecnologia Nuclear/CDTN, Belo Horizonte, MG, Brasil-
dc.identifier.fasciculo2-
dc.identifier.vol6-
dc.identifier.extentp. 173-178-
dc.title.journalMaterials Research São Carlos-
Appears in Collections:Artigo de periódico

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